Diffusion Profile of Some Metal Ions in Chalcogenide...

Japanese Journal of Applied Physics 1984 / 8 Vol. 23; Iss. Part 2, No

Diffusion Profile of Some Metal Ions in Chalcogenide Amorphous Semiconductors

Okano, Shuichi, Suzuki, Masakuni, Fukada, Noboru, Imura, Takeshi, Hiraki, Akio
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Volume:
23
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L651
Date:
August, 1984
File:
PDF, 1.02 MB
english, 1984
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