Properties of Amorphous Silicon Nitride Prepared at High...

Japanese Journal of Applied Physics 1985 / 6 Vol. 24; Iss. Part 2, No

Properties of Amorphous Silicon Nitride Prepared at High Deposition Rate

Nishibayashi, Yoshiki, Imura, Takeshi, Osaka, Yukio, Shizuma, Kiyoshi, Nishiyama, Fumitaka
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L469
Date:
June, 1985
File:
PDF, 384 KB
1985
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