Boron Doping Effects in Lateral Solid Phase Epitaxy of...

Japanese Journal of Applied Physics 1985 / 7 Vol. 24; Iss. Part 2, No

Boron Doping Effects in Lateral Solid Phase Epitaxy of Amorphous Si Films

Ishiwara, Hiroshi, Tamba, Akihiro, Yamamoto, Hiroshi, Furukawa, Seijiro
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Volume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L513
Date:
July, 1985
File:
PDF, 450 KB
english, 1985
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