Preparation and Properties of a-Si Films Deposited at a...

Japanese Journal of Applied Physics 1988 / 1 Vol. 27; Iss. Part 1, No

Preparation and Properties of a-Si Films Deposited at a High Deposition Rate under a Magnetic Field

Ohnishi, Michitoshi, Nishiwaki, Hidenori, Uchihashi, Kenji, Yoshida, Kazuhiro, Tanaka, Makoto, Ninomiya, Kunimoto, Nishikuni, Masato, Nakamura, Noboru, Tsuda, Shinya, Nakano, Shoichi, Yazaki, Takehito
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Volume:
27
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.40
Date:
January, 1988
File:
PDF, 182 KB
english, 1988
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