Etching Rate Control by MeV O +...

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 1, No

Etching Rate Control by MeV O + Implantation for Laser-Chemical Reaction of Ferrite

Lu, Yong Feng, Takai, Mikio, Chayahara, Akiyoshi, Satou, Mamoru, Sanda, Hiroyuki, Nagatomo, Syohei, Namba, Susumu
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2260
Date:
October, 1990
File:
PDF, 197 KB
english, 1990
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