Effect of Discharge Gas Pressure on YBaCuO Epitaxial Film...

Japanese Journal of Applied Physics 1990 / 4 Vol. 29; Iss. Part 2, No

Effect of Discharge Gas Pressure on YBaCuO Epitaxial Film Formation by Reactive RF Magnetron Sputtering

Sakuta, Ken, Iyori, Masahiro, Katayama, Yoshitomo, Kobayashi, Takeshi
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L611
Date:
April, 1990
File:
PDF, 458 KB
1990
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