Low-Temperature Etching of 0.2 µm Al Patterns Using a SiO...

Japanese Journal of Applied Physics 1992 / 12 Vol. 31; Iss. Part 1, No

Low-Temperature Etching of 0.2 µm Al Patterns Using a SiO 2 Mask

Aoki, Hidemitsu, Hashimoto, Toshiki, Ikawa, Eiji, Kikkawa, Takamaro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
31
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.4376
Date:
December, 1992
File:
PDF, 571 KB
english, 1992
Conversion to is in progress
Conversion to is failed