Reflection High-Energy Electron Diffraction Intensity...

Japanese Journal of Applied Physics 1992 / 8 Vol. 31; Iss. Part 2, No

Reflection High-Energy Electron Diffraction Intensity Oscillations during Si MBE Growth on HF-Treated Si(111) Surface

Kumagai, Yoshinao, Fujii, Kunihiro, Matsumoto, Hisashi, Hasegawa, Fumio
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.L1103
Date:
August, 1992
File:
PDF, 650 KB
1992
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