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Crystal Structure of TiN Film Fabricated by Reactive Sputtering on Si(100) Substrate
Tsuchida, Masahiko, Kuroda, Tsukasa, Iwakuro, Hiroaki, Shimizu, TakashiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.1227
Date:
March, 1993
File:
PDF, 370 KB
english, 1993