Comparison of Measurement Techniques for Gate Shortening in...

Japanese Journal of Applied Physics 1993 / 8 Vol. 32; Iss. Part 1, No

Comparison of Measurement Techniques for Gate Shortening in Sub-Micrometer Metal Oxide Semiconductor Field Effect Transistors

Bhattacharya, Pradeep, Bari, Mohammad, Rao, Krishnaraj
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3409
Date:
August, 1993
File:
PDF, 5.31 MB
english, 1993
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