Diffusivity of Self-Interstitials and Vacancies in Silicon

Japanese Journal of Applied Physics 1993 / 6 Vol. 32; Iss. Part 2, No

Diffusivity of Self-Interstitials and Vacancies in Silicon

Okino, Takahisa
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.L856
Date:
June, 1993
File:
PDF, 378 KB
english, 1993
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