Submicron Patterning Technique for $\bf...

Japanese Journal of Applied Physics 1994 / 8 Vol. 33; Iss. Part 2, No

Submicron Patterning Technique for $\bf YBa_{2}Cu_{3}O_{\ninmbi y}$ Films Using Focused Ion Beam Lithography

Kusunoki, Masanobu, Akaike, Hiroyuki, Fujimaki, Akira, Hayakawa, Hisao
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1124
Date:
August, 1994
File:
PDF, 195 KB
english, 1994
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