Step Coverage Analysis for Hexamethyldisiloxane and Ozone Atmospheric Pressure Chemical Vapor Deposition
Fujino, Katsuhiro, Egashira, Yasuyuki, Shimogaki, Yukihiro, Komiyama, HiroshiVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L473
Date:
March, 1994
File:
PDF, 1.04 MB
english, 1994