\bfi In situ Monitoring of Product Species in Plasma...

Japanese Journal of Applied Physics 1995 / 7 Vol. 34; Iss. Part 1, No

\bfi In situ Monitoring of Product Species in Plasma Etching by Fourier Transform Infrared Absorption Spectroscopy

Nishikawa, Kazuyasu, Ono, Kouichi, Tuda, Mutumi, Oomori, Tatsuo, Namba, Keisuke
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Volume:
34
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.3731
Date:
July, 1995
File:
PDF, 2.26 MB
1995
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