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Etching for 0.15-µ m -Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources
Oomori, Tatsuo, Taki, Masakazu, Nishikawa, Kazuyasu, Ootera, HirokiVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6809
Date:
December, 1995
File:
PDF, 116 KB
english, 1995