Etching for 0.15-µ...

Etching for 0.15-µ m -Level Patterns with Low Microloading Effect Using Beam Plasmas Generated by Gas Puff Plasma Sources

Oomori, Tatsuo, Taki, Masakazu, Nishikawa, Kazuyasu, Ootera, Hiroki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6809
Date:
December, 1995
File:
PDF, 116 KB
english, 1995
Conversion to is in progress
Conversion to is failed