Analysis of Overlay Accuracy in...

Japanese Journal of Applied Physics 1997 / 6 Vol. 36; Iss. Part 1, No

Analysis of Overlay Accuracy in 0.14 µ m Device Fabrication using Synchrotron Radiation Lithography

Hifumi, Takashi, Sumitani, Hiroaki, Itoga, Kenji, Watanabe, Hiroshi, Inoue, Masami, Marumoto, Kenji, Ohsawa, Hiroshi, Saitoh, Kenji
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.3463
Date:
June, 1997
File:
PDF, 314 KB
english, 1997
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