Amorphous and Microcrystalline Silicon Deposited by...

Japanese Journal of Applied Physics 1997 / 1 Vol. 36; Iss. Part 1, No

Amorphous and Microcrystalline Silicon Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

Conde, João Pedro, Schotten, Volker, Arekat, Safwan, Brogueira, Pedro, Sousa, Rui, Chu, Virginia
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.38
Date:
January, 1997
File:
PDF, 248 KB
english, 1997
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