Impact of Thermal Nitridation on Microscopic Stress-Induced...

Japanese Journal of Applied Physics 2000 / 3 Vol. 39; Iss. Part 1, No

Impact of Thermal Nitridation on Microscopic Stress-Induced Leakage Current in Sub-10-nm Silicon Dioxides

Ogata, Tamotsu, Inoue, Masao, Nakamura, Tadashi, Tsuji, Naoki, Kobayashi, Kiyoteru, Kawase, Kazuo, Kurokawa, Hiroshi, Kaneoka, Tatsunori, Wake, Setsuo, Arima, Hideaki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
39
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.1027
Date:
March, 2000
File:
PDF, 417 KB
2000
Conversion to is in progress
Conversion to is failed