Thermal Stability and Interfacial Reaction of Barrier...

Japanese Journal of Applied Physics 2000 / 6 Vol. 39; Iss. Part 2, No

Thermal Stability and Interfacial Reaction of Barrier Layers with Low-Dielectric-Constant Fluorinated Carbon Interlayer

Hara, Tohru, Sakamoto, Keiichi, Togoh, Fumiaki, Yang, Hongning, Evans, David R.
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.L506
Date:
June, 2000
File:
PDF, 233 KB
english, 2000
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