Effect of Hydrogen Plasma Treatment on Formation of Amorphous Silicon Film Using Organosoluble Silicon Cluster as a Precursor
Watanabe, Akira, Unno, Masashi, Hojo, Fusao, Miwa, TakaoVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.L961
Date:
October, 2000
File:
PDF, 187 KB
english, 2000