![](/img/cover-not-exists.png)
Si Etching with High Aspect Ratio and Smooth Side Profile for Mold Fabrication
Kawata, Hiroaki, Yasuda, Masaaki, Hirai, YoshihikoVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.5597
Date:
June, 2006
File:
PDF, 179 KB
english, 2006