Thermal Stability of HfO 2...

Japanese Journal of Applied Physics 2008 / 1 Vol. 47; Iss. 1

Thermal Stability of HfO 2 Films Fabricated by Metal Organic Chemical Vapor Deposition

Nagasato, Yoshitaka, Iwazaki, Yoshitaka, Hasumi, Masahiko, Ueno, Tomo, Kuroiwa, Koichi
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.31
Date:
January, 2008
File:
PDF, 366 KB
english, 2008
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