32 nm Half Pitch Formation with High-Numerical-Aperture...

Japanese Journal of Applied Physics 2009 / 10 Vol. 48; Iss. 10

32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure

Jung, Minhee, Park, Joon-Min, Oh, Hye-Keun
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.106501
Date:
October, 2009
File:
PDF, 319 KB
english, 2009
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