Microstructure of SiO x...

Chinese Physics 2000 / 04 Vol. 9; Iss. 4

Microstructure of SiO x :H Films prepared by plasma enhanced chemical vapor deposition

Zhi-xun, Ma, Xian-bo, Liao, Guang-lin, Kong, Jun-hao, Chu
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Volume:
9
Language:
english
Journal:
Chinese Physics
DOI:
10.1088/1009-1963/9/4/011
Date:
April, 2000
File:
PDF, 127 KB
english, 2000
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