Contact Resistance of Al/Si Ohmic Electrodes Formed by...

Japanese Journal of Applied Physics 1983 / 6 Vol. 22; Iss. Part 2, No

Contact Resistance of Al/Si Ohmic Electrodes Formed by Rapid Lamp Sintering.

Hara, Tohru, Suzuki, Hidenori, Furukawa, Masakazu, Amemiya, Kimio
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Volume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L340
Date:
June, 1983
File:
PDF, 238 KB
english, 1983
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