Nanometer Pattern Delineation by Electron and Ion Beam...

Japanese Journal of Applied Physics 1984 / 3 Vol. 23; Iss. Part 2, No

Nanometer Pattern Delineation by Electron and Ion Beam Lithography

Gamo, Kenji, Yamashita, Kazuhiro, Namba, Susumu
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Volume:
23
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L141
Date:
March, 1984
File:
PDF, 590 KB
english, 1984
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