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Nanometer Pattern Delineation by Electron and Ion Beam Lithography
Gamo, Kenji, Yamashita, Kazuhiro, Namba, SusumuVolume:
23
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L141
Date:
March, 1984
File:
PDF, 590 KB
english, 1984