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Stability of Mo Gate MOS Devices Using High Purity Sputtering Target
Amazawa, Takao, Oikawa, Hideo, Shiono, Noboru, Honma, NakahachiroVolume:
23
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L859
Date:
November, 1984
File:
PDF, 130 KB
english, 1984