A New Method of Measuring Internal Stress in Thin Films Deposited on Silicon by Raman Spectroscopy
Iwaoka, Teiji, Yokoyama, Shin, Osaka, YukioVolume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.112
Date:
January, 1985
File:
PDF, 493 KB
english, 1985