Improvement of SiO 2 /Si Interface Properties Utilising Fluorine Ion Implantation and Drive-in Diffusion
Ohyu, Kiyonori, Itoga, Toshihiko, Nishioka, Yasushiro, Natsuaki, NobuyoshiVolume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.1041
Date:
June, 1989
File:
PDF, 648 KB
1989