Effect of Deposition Temperature on the Properties of...

Japanese Journal of Applied Physics 1989 / 8 Vol. 28; Iss. Part 1, No

Effect of Deposition Temperature on the Properties of Magnetron Sputtered Hydrogenated Amorphous Silicon Films

Banerjee, Ratnabali, Das, Debajyoti, Batabyal, A. K., Barua, A. K.
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Volume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.1320
Date:
August, 1989
File:
PDF, 484 KB
1989
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