Low-Temperature Cleaning of HF-Passivated Si(111) Surface...

Japanese Journal of Applied Physics 1989 / 7 Vol. 28; Iss. Part 2, No

Low-Temperature Cleaning of HF-Passivated Si(111) Surface with VUV Light

Takakuwa, Yuji, Nogawa, Masafumi, Niwano, Michio, Katakura, Hitoshi, Matsuyoshi, Satoshi, Ishida, Hiroyuki, Kato, Hiroo, Miyamoto, Nobuo
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Volume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.L1274
Date:
July, 1989
File:
PDF, 635 KB
1989
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