Dry Oxidation Study on CVD-SiO 2...

Japanese Journal of Applied Physics 1989 / 12 Vol. 28; Iss. Part 2, No

Dry Oxidation Study on CVD-SiO 2 /Thermal-SiO 2 /Si Structure

Kuroda, Shigeki, Nishi, Kenji, Ueda, Jun
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Volume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.L2294
Date:
December, 1989
File:
PDF, 464 KB
1989
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