Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution
Kawai, Akira, Nagata, Hitoshi, Takata, MasasukeVolume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.1933
Date:
June, 1992
File:
PDF, 421 KB
1992