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Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
Koto, Makoto, Narai, Akira, Sakaue, Hiroyuki, Shindo, Haruo, Horiike, YasuhiroVolume:
31
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.4338
Date:
December, 1992
File:
PDF, 262 KB
english, 1992