Study of the Etching Reaction by Atomic Chlorine Using...

Japanese Journal of Applied Physics 1994 / 4 Vol. 33; Iss. Part 1, No

Study of the Etching Reaction by Atomic Chlorine Using Molecular Beam Scattering

Karahashi, Kazuhiro, Matsuo, Jiro, Horiuchi, Kei
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.2252
Date:
April, 1994
File:
PDF, 501 KB
1994
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