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Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask
Yim, Donggyu, Lee, Seonbok, Lee, Sungmuk, Oh, Yong Ho, Chung, Hai Bin, Yoo, Hyung JounVolume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.780
Date:
February, 1996
File:
PDF, 178 KB
english, 1996