Effect of Degree of Coherence in Optical Lithography Using...

Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask

Yim, Donggyu, Lee, Seonbok, Lee, Sungmuk, Oh, Yong Ho, Chung, Hai Bin, Yoo, Hyung Joun
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Volume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.780
Date:
February, 1996
File:
PDF, 178 KB
english, 1996
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