New Ellipsometric Approach to Critical Dimension Metrology Utilizing Form Birefringence Inherent in a Submicron Line-and-Space Pattern
Takeuchi, Seiji, Yoshii, Minoru, Yamamoto, MasakiVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7720
Date:
December, 1997
File:
PDF, 409 KB
1997