Impact of Polymetal Gate Etch Post-Cleaning on Data...

Japanese Journal of Applied Physics 2002 / 4 Vol. 41; Iss. Part 1, No

Impact of Polymetal Gate Etch Post-Cleaning on Data Retention Time in Sub-micron DRAM Cells

Kim, Nam-Sung, Kim, Il-Gweon, Choy, Jun-Ho, Park, Joo-Seog
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.2385
Date:
April, 2002
File:
PDF, 620 KB
english, 2002
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