Applicability of Phosphorus and Boron Diffusion Parameters...

Japanese Journal of Applied Physics 2003 / 4 Vol. 42; Iss. Part 1, No

Applicability of Phosphorus and Boron Diffusion Parameters Extracted from Predeposition to Drive-in Diffusion for Bulk Silicon and Silicon-on-Insulator

Arai, Eisuke, Iida, Daisuke, Asai, Hiroshi, Ieki, Yasushi, Uchida, Hideo, Ichimura, Masaya
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.1503
Date:
April, 2003
File:
PDF, 236 KB
english, 2003
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