High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing
Ogino, Kozo, Hoshino, Hiromi, Machida, Yasuhide, Osawa, Morimi, Arimoto, Hiroshi, Takahashi, Kimitoshi, Yamashita, HiroshiVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.3827
Date:
June, 2003
File:
PDF, 393 KB
english, 2003