Investigation of Surface Contamination on Silicon Oxide...

Japanese Journal of Applied Physics 2003 / 12 Vol. 42; Iss. Part 1, No

Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method

Kohno, Motohiro, Kitajima, Toshikazu, Hirae, Sadao, Yokoyama, Shin
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.7601
Date:
December, 2003
File:
PDF, 332 KB
english, 2003
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