Simulation of Fogging Electrons in Electron Beam Lithography
Kotera, Masatoshi, Maekawa, TakeshiVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.06FB05
Date:
June, 2009
File:
PDF, 388 KB
english, 2009