Resolution Enhancement for Beyond-22-nm Node Using Extreme...

Japanese Journal of Applied Physics 2010 / 6 Vol. 49; Iss. 6

Resolution Enhancement for Beyond-22-nm Node Using Extreme Ultraviolet Exposure Tool

Tawarayama, Kazuo, Aoyama, Hajime, Matsunaga, Kentaro, Magoshi, Shunko, Arisawa, Yukiyasu, Uno, Taiga
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.06GD01
Date:
June, 2010
File:
PDF, 201 KB
english, 2010
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