Electrical Characteristics of TiSi 2...

Japanese Journal of Applied Physics 2010 / 6 Vol. 49; Iss. 6

Electrical Characteristics of TiSi 2 Nanocrystal Nonvolatile Memory with Barrier-Engineered Tunnel Layer

Han, Seung Jong, Lee, Dong Uk, Seo, Ki Bong, Kim, Seon Pil, Kim, Eun Kyu, Oh, Jun-Seok, Cho, Won-Ju
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.06GG14
Date:
June, 2010
File:
PDF, 355 KB
english, 2010
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