Silicon Surface Morphology after Annealing in Ambient...

Japanese Journal of Applied Physics 2011 / 2 Vol. 50; Iss. 2

Silicon Surface Morphology after Annealing in Ambient Hydrogen Containing a Trace Amount of Hydrogen Halide Gas

Habuka, Hitoshi, Nishida, Takayuki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.025701
Date:
February, 2011
File:
PDF, 257 KB
english, 2011
Conversion to is in progress
Conversion to is failed