Evaluation of the WO$_{x}$ Film Properties for Resistive Random Access Memory Application
Chen, Yi-Yueh, Chien, Wei-Chih, Lee, Ming-Hsiu, Chen, Yi-Chou, Chuang, Alfred T. H., Hong, Tian-Jue, Lin, Su-Jien, Wu, Tai-Bor, Lu, Chih-YuanVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.04DD15
Date:
April, 2012
File:
PDF, 127 KB
english, 2012