Optimization of Ge–Sb–Sn–O Films for Thermal Lithography of...

Japanese Journal of Applied Physics 2012 / 6 Vol. 51

Optimization of Ge–Sb–Sn–O Films for Thermal Lithography of Submicron Structures

Chen, Jhewn-Kuang, Lin, Jing-Wen, Chen, Jung-Po, Chiu, Kuo-Chi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.06FC03
Date:
June, 2012
File:
PDF, 1.32 MB
english, 2012
Conversion to is in progress
Conversion to is failed