Atomic layer deposition of stoichiometric Co3O4 films using bis(1,4-di-iso-propyl-1,4-diazabutadiene) cobalt
Han, Byeol, Park, Jae-Min, Choi, Kyu Ha, Lim, Wan-Kyu, Mayangsari, Tirta R., Koh, Wonyong, Lee, Won-JunVolume:
589
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.07.003
Date:
August, 2015
File:
PDF, 1.17 MB
english, 2015