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Electrical Conduction of Silicon Nitride Films Deposited by SiH 4 -NH 3 Reaction
Misawa, Yutaka, Yagi, HideyukiVolume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.15.1045
Date:
June, 1976
File:
PDF, 342 KB
english, 1976