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Formation of a Stacking Fault-Free Region in Thermally Oxidized Silicon
Shimizu, Hirofumi, Yoshinaka, Akira, Sugita, YoshimitsuVolume:
17
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.17.767
Date:
May, 1978
File:
PDF, 375 KB
english, 1978